Gradus nuclei hafnium oxydatum

Description:

Product Name: Hafnium oxydatum nuclei gradus
CAS: 12055-23-1
MF: HfO2
MW:210.49
EINECS: 235-013-2

Product Detail

Product Tags

Species et descriptio
Hafnium oxydatumprincipale est oxydi hafnii, est album inodorum et insulsum in communibus circumstantiis.

Nomen: hafnium dioxide	Formulae chemicae:HfO2
Pondus hypotheticum: 210.6	Densitas: 9.68 g/cm3
Punctum liquescens : 2850	Fervens punctum: 5400

Product possessiones

Hafnium oxydatumEst genus non-toxicum et insulsum album solidum, non resolutum in aqua, acidum hydrochloricum et acidum nitricum, solutum in acido sulphurico et acido sulphurico et hydrogenio fluoride chemico stupido, cum proprietatibus tenuibus cinematographicis: range translucens～220～12000nm ；refractivus index（250nm）～2.15 500nm）～2， cum puncto alto liquefaciens, sic amplis usibus finem habet.

Applicationem

1) Rudis materies ad zirconium metallum et ejus composita;

2) laterum zirconium, zirconium fistularum, uasculorum etc. ad liquefactionem ceramicorum quotidianorum, materias refractorias et metalla pretiosa;

3) Scelerisque impedimentum coatings in aviationum et turbines gasi industriae;

4) Zirconia etiam adhiberi potest ut materia matrix ad agentes expoliendum, particulas laesivas, ceramicos piezoelectricas, subtilitatem ceramicam, glazes ceramicam, et pigmenta summus temperatura.Praecipua materia est rudis pro consequat X-radii, in lampadibus in spectrometris infrarubeis fons lucis, et terebras artificiales.

Qualitas signa:

Inceptum vexillum: nuclei gradus zirconia chemicae compositio mensae massae fraction/%

Product gradus			Primus gradus	Secundus gradus	Tertius gradus	Nota
Product numerus			SHXLHFO2-01	SHXLHFO2-02	SHXLHFO2-03
Compositio chemica (fractio massa)/%	immunditias	ZrO2	≥99	≥99	≥98
		Al	≤0.010	≤0.010	≤0.015
		B	≤0.00005	≤0.00005	≤0.0001
		Cd	≤0.00005	≤0.00005	≤0.0001
		Cr	≤0.003	≤0.003	≤0.005
		Cu	≤0.001	≤0.001	≤0.0015
		Fe	≤0.020	≤0.020	≤0.030
		Hf	Hf≤0.006	0.006＜Hf＜0.008	0.008＜Hf＜0.010
		Mg	≤0.005	≤0.005	≤0.010
		Mn	≤0.002	≤0.002	≤0.003
		Mo	≤0.002	≤0.002	≤0.003
		Ni	≤0.002	≤0.002	≤0.003
		Si	≤0.010	≤0.010	≤0.015
		Sn	≤0.002	≤0.002	≤0.005
		Ti	≤0.010	≤0.010	≤0.015
		V	≤0.002	≤0.002	≤0.003
		Igloss (950℃)	1.0	1.0	2.0
		particula	-200 mesh≥98%,-200 reticulum ~+400 Mesh≥65%